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Cited 84 time in webofscience Cited 92 time in scopus
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dc.contributor.authorBlack, CT-
dc.contributor.authorGuarini, KW-
dc.contributor.authorZhang, Y-
dc.contributor.authorKim, HJ-
dc.contributor.authorBenedict, J-
dc.contributor.authorSikorski, E-
dc.contributor.authorBabich, IV-
dc.contributor.authorMilkove, KR-
dc.date.accessioned2016-04-01T08:24:02Z-
dc.date.available2016-04-01T08:24:02Z-
dc.date.created2009-10-21-
dc.date.issued2004-09-
dc.identifier.issn0741-3106-
dc.identifier.other2004-OAK-0000019190-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/27884-
dc.description.abstractWe combine nanometer-scale polymer self assembly With advanced semiconductor microfabrication to produce metaloxide-semiconductor (MOS) capacitors with accumulation capacitance more than 400% higher than planar devices of the same lateral area. The-self assembly technique achieves this degree of enhancement using only standard processing techniques, thereby obviating additional process complexity. These devices are suitable for use as on-chip power supply decoupling capacitors, particularly in high-performance silicon-on-insulator technology.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGI-
dc.relation.isPartOfIEEE ELECTRON DEVICE LETTERS-
dc.titleHigh-capacity, self-assembled metal-oxide-semiconductor decoupling capacitors-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1109/LED.2004.834637-
dc.author.googleBlack, CT-
dc.author.googleGuarini, KW-
dc.author.googleZhang, Y-
dc.author.googleKim, HJ-
dc.author.googleBenedict, J-
dc.author.googleSikorski, E-
dc.author.googleBabich, IV-
dc.author.googleMilkove, KR-
dc.relation.volume25-
dc.relation.issue9-
dc.relation.startpage622-
dc.relation.lastpage624-
dc.relation.journalIEEE ELECTRON DEVICE LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationIEEE ELECTRON DEVICE LETTERS, v.25, no.9, pp.622 - 624-
dc.identifier.wosid000223577600011-
dc.date.tcdate2019-02-01-
dc.citation.endPage624-
dc.citation.number9-
dc.citation.startPage622-
dc.citation.titleIEEE ELECTRON DEVICE LETTERS-
dc.citation.volume25-
dc.contributor.affiliatedAuthorKim, HJ-
dc.identifier.scopusid2-s2.0-4444272969-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc75-
dc.type.docTypeArticle-
dc.subject.keywordPlusINTEGRATION-
dc.subject.keywordPlusTEMPLATES-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusFILMS-
dc.subject.keywordAuthordecoupling capacitor-
dc.subject.keywordAuthorhigh surface area-
dc.subject.keywordAuthormetaloxide-semiconductor-
dc.subject.keywordAuthorself assembly-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-

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김형준KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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