Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods
SCIE
SCOPUS
- Title
- Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods
- Authors
- Xi, JQ; Kim, JK; Schubert, EF; Ye, DX; Lu, TM; Lin, SY; Juneja, JS
- Date Issued
- 2006-03-01
- Publisher
- OPTICAL SOC AMER
- Abstract
- The refractive-index contrast in dielectric multilayer structures, optical resonators, and photonic crystals is an important figure of merit that creates a strong demand for high-quality thin films with a low refractive index. A SiO2 nanorod layer with low refractive index of n = 1.08, to our knowledge the lowest ever reported in thin-film materials, is grown by oblique-angle electron-beam deposition Of SiO2. A single-pair distributed Bragg reflector employing a SiO2 nanorod layer is demonstrated to have enhanced reflectivity, showing the great potential of low-refractive-index films for applications in photonic structures and devices. (c) 2006 Optical Society of America.
- Keywords
- OMNIDIRECTIONAL REFLECTOR; DIELECTRICS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/28153
- DOI
- 10.1364/OL.31.000601
- ISSN
- 0146-9592
- Article Type
- Article
- Citation
- OPTICS LETTERS, vol. 31, no. 5, page. 601 - 603, 2006-03-01
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- There are no files associated with this item.
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