DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, DJ | - |
dc.contributor.author | Kang, SW | - |
dc.contributor.author | Rhee, SW | - |
dc.date.accessioned | 2016-04-01T09:17:06Z | - |
dc.date.available | 2016-04-01T09:17:06Z | - |
dc.date.created | 2009-03-16 | - |
dc.date.issued | 2002-06-24 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.other | 2002-OAK-0000010413 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/29796 | - |
dc.description.abstract | Direct liquid injection (DLI) of Ru(tmhd)(3) (tmhd = 2,2,6,6-tetramethylheptane-3,5-dione) in n-butylacetate solvent was used to deposit ruthenium oxide and ruthenium thin films in the temperature range of 250-450 degreesC. Arrhenius plot showed that the mass transfer of the reactant determined the deposition rate at high temperature and it was determined by the surface reaction at lower temperature. Depending on the operating conditions, oxide phase, metal phase or mixed phase was obtained. At low O-2 flow rate and high injection rate of the precursor solution, the formation of ruthenium was preferred. For example, at the condition of the injection rate of 0.07 ml/min and O-2 flow rate of 300 sccm, ruthenium metal phase was deposited over 350 degreesC. At lower injection rate, ruthenium oxide films with low resistivity of approximately 45-60 muOmega cm were formed which showed dense and smooth surface morphology At high deposition temperature, the resistivity of the film was increased due to the carbon incorporation. (C) 2002 Elsevier Science B.V. All rights reserved. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.relation.isPartOf | THIN SOLID FILMS | - |
dc.subject | DLI-MOCVD | - |
dc.subject | ruthenium oxide | - |
dc.subject | ruthenium | - |
dc.subject | Ru(tmhd)(3) | - |
dc.subject | electrode | - |
dc.subject | RUO2 | - |
dc.subject | ELECTRODES | - |
dc.subject | PRECURSOR | - |
dc.subject | GROWTH | - |
dc.title | Chemical vapor deposition of ruthenium oxide thin films from Ru(tmhd)(3) using direct liquid injection | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | - |
dc.identifier.doi | 10.1016/S0040-6090(02)00439-X | - |
dc.author.google | Lee, DJ | - |
dc.author.google | Kang, SW | - |
dc.author.google | Rhee, SW | - |
dc.relation.volume | 413 | - |
dc.relation.issue | 1-2 | - |
dc.relation.startpage | 237 | - |
dc.relation.lastpage | 242 | - |
dc.contributor.id | 10052631 | - |
dc.relation.journal | THIN SOLID FILMS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.413, no.1-2, pp.237 - 242 | - |
dc.identifier.wosid | 000177272700034 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 242 | - |
dc.citation.number | 1-2 | - |
dc.citation.startPage | 237 | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 413 | - |
dc.contributor.affiliatedAuthor | Rhee, SW | - |
dc.identifier.scopusid | 2-s2.0-0037166604 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 35 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | RUO2 | - |
dc.subject.keywordPlus | ELECTRODES | - |
dc.subject.keywordPlus | PRECURSOR | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordAuthor | DLI-MOCVD | - |
dc.subject.keywordAuthor | ruthenium oxide | - |
dc.subject.keywordAuthor | ruthenium | - |
dc.subject.keywordAuthor | Ru(tmhd)(3) | - |
dc.subject.keywordAuthor | electrode | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
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