Energy bandgap variation in oblique angle-deposited indium tin oxide
SCIE
SCOPUS
- Title
- Energy bandgap variation in oblique angle-deposited indium tin oxide
- Authors
- Kim, K; Park, JH; Kim, H; Kim, JK; Schubert, EF; Cho, J
- Date Issued
- 2016-01-25
- Publisher
- AIP Publishing
- Abstract
- Indium tin oxide (ITO) thin films deposited using the oblique angle deposition (OAD) technique exhibit a strong correlation between structural and optical properties, especially the optical bandgap energy. The microstructural properties of ITO thin films are strongly influenced by the tilt angle used during the OAD process. When changing the tilt angle, the refractive index, porosity, and optical bandgap energy of ITO films also change due to the existence of a preferential growth direction at the interface between ITO and the substrate. Experiments reveal that the ITO film's optical bandgap varies from 3.98 eV (at normal incident deposition) to 3.87 eV (at a 60 degrees tilt angle). (C) 2016 AIP Publishing LLC.
- Keywords
- Photonic bandgap materials; Refractive index; Electron beam deposition; Thin film growth; X-ray diffraction
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/36488
- DOI
- 10.1063/1.4940998
- ISSN
- 0003-6951
- Article Type
- Article
- Citation
- APPLIED PHYSICS LETTERS, vol. 108, no. 4, page. 41910, 2016-01-25
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- There are no files associated with this item.
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