Ultrathin and Flat Layer Black Phosphorus Fabricated by Reactive Oxygen and Water Rinse by Reactive Oxygen
SCIE
SCOPUS
- Title
- Ultrathin and Flat Layer Black Phosphorus Fabricated by Reactive Oxygen and Water Rinse by Reactive Oxygen
- Authors
- Kwon, H; Seo, SW; Kim, TG; Lee, ES; Lanh, PT; Yang, S; Ryu, S; Kim, JW
- Date Issued
- 2016-09
- Publisher
- AMERICAN CHEMICAL SOCIETY
- Abstract
- Ultrathin black phosphorus (BP) is one of the promising two-dimensional (2D) materials for future optoelectronic devices. Its chemical instability in ambient conditions and lack of a bottom-up approach for its synthesis necessitate efficient etching methods that generate BP films of designed thickness with stable and high-quality surfaces. Herein, reporting a photochemical etching method, we demonstrate a controlled layer-by-layer thinning of thick BP films down to a few layers or a single layer and confirm their Raman and photoluminescence characteristics. Ozone molecules generated by O-2 photolysis oxidize BP, forming P2O5-like oxides. When the resulting phosphorus oxides are removed by water, the surface of BP with preset thickness is highly flat and self-protective by surface oxygen functional groups. This method provides a fabrication strategy of BP and possibly other 2D semiconductors with band gaps tuned by their thickness.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/37958
- DOI
- 10.1021/ACSNANO.6B04194
- ISSN
- 1936-0851
- Article Type
- Article
- Citation
- ACS Nano, vol. 10, no. 9, page. 8723 - 8731, 2016-09
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.