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Investigation of Threshold Voltage Variation under Negative-Bias Stress Condition of SiC Double-Implanted MOSFETs
- Title
- Investigation of Threshold Voltage Variation under Negative-Bias Stress Condition of SiC Double-Implanted MOSFETs
- Authors
- Lee, Jeong-Soo; Baek, Sangwon; Jin, Bo; Lee, Junyoung; Kim, Jiwon; Oh, Hyeongwan; Park, Chanoh; Kim, Donghoon
- Date Issued
- 2017-02-14
- Publisher
- KCS
- Article Type
- Conference
- Citation
- 제24회 한국반도체학술대회 (KCS 2017), 2017-02-14
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Related Researcher
- 이정수LEE, JEONG SOO
- Dept of Electrical Enginrg