Plasma enhanced atomic layer deposition of TaCxNy thin film with TBTDET and methane/hydrogen gas for NMOSFET gate electrode
- Title
- Plasma enhanced atomic layer deposition of TaCxNy thin film with TBTDET and methane/hydrogen gas for NMOSFET gate electrode
- Authors
- 이시우; 조기희
- Date Issued
- 2010-06-22
- Publisher
- ALD 2010
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/46938
- Article Type
- Conference
- Citation
- 10th International Conference on Atomic Layer Deposition, Seoul Education Culture Center, 2010-06-22
- Files in This Item:
- There are no files associated with this item.
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