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Conference
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dc.contributor.author김우희-
dc.contributor.author이한보람-
dc.contributor.authorKwang Heo-
dc.contributor.authorSeunghun Hong-
dc.contributor.author김형준-
dc.date.accessioned2018-06-15T06:51:49Z-
dc.date.available2018-06-15T06:51:49Z-
dc.date.created2009-07-29-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/51656-
dc.publisher재료학회-
dc.relation.isPartOf2009년도 재료학회 춘계학술 대회 및 제 16회 신소재 심포지엄-
dc.titleHigh Quality Nickel Atomic Layer Deposition for Nanoscale Contact Applications-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitation2009년도 재료학회 춘계학술 대회 및 제 16회 신소재 심포지엄-
dc.citation.conferenceDate2009-05-22-
dc.citation.conferencePlaceKO-
dc.citation.title2009년도 재료학회 춘계학술 대회 및 제 16회 신소재 심포지엄-
dc.contributor.affiliatedAuthor김우희-
dc.contributor.affiliatedAuthor이한보람-
dc.contributor.affiliatedAuthor김형준-
dc.description.journalClass2-
dc.description.journalClass2-

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김형준KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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