Copper Vapor-Assisted Chemical Vapor Deposition for High Quality and Single Layer Graphene on Amorphous SiO2/Si Substrate
- Title
- Copper Vapor-Assisted Chemical Vapor Deposition for High Quality and Single Layer Graphene on Amorphous SiO2/Si Substrate
- Authors
- 최희철; 김형기; 송인택; 박치범; 홍미선
- Date Issued
- 2013-08-26
- Publisher
- (사)대한화학회 무기화학분과회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/64883
- Article Type
- Conference
- Citation
- 2013 무기화학분과 하계 심포지움, 2013-08-26
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- There are no files associated with this item.
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