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The Performance of HfSiON/TiN Gate Stack MOSFETs for 45 nm Node LSTP Application Using Conventional Fabrication Process
- Title
- The Performance of HfSiON/TiN Gate Stack MOSFETs for 45 nm Node LSTP Application Using Conventional Fabrication Process
- Authors
- 정윤하
- Publisher
- IEEE
- Article Type
- Conference
- Citation
- IEEE Nanotechnology Materials and Devices Conference 2008, page. 251
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Related Researcher
- 정윤하JEONG, YOON HA
- Dept of Electrical Enginrg