Two-step electron beam lithography to fabricate 20 nm T-gate
- Title
- Two-step electron beam lithography to fabricate 20 nm T-gate
- Authors
- 정윤하
- Publisher
- IEEK
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/88189
- Article Type
- Conference
- Citation
- IEEK Summer Conference 2006, page. 555 - 556
- Files in This Item:
- There are no files associated with this item.
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