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Two-step electron beam lithography to fabricate 20 nm T-gate

Title
Two-step electron beam lithography to fabricate 20 nm T-gate
Authors
정윤하
Publisher
IEEK
URI
https://oasis.postech.ac.kr/handle/2014.oak/88189
Article Type
Conference
Citation
IEEK Summer Conference 2006, page. 555 - 556
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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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