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Cited 85 time in webofscience Cited 93 time in scopus
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dc.contributor.authorShannigrahi, SR-
dc.contributor.authorJang, HM-
dc.date.accessioned2015-06-25T01:06:51Z-
dc.date.available2015-06-25T01:06:51Z-
dc.date.created2009-02-28-
dc.date.issued2001-08-13-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000002113en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9413-
dc.description.abstractThe development of lead zirconate titanate (PZT)-based capacitors has been a long time goal of ferroelectric random access memories (FRAM). However, PZT-based perovskites with common platinum (Pt) electrodes have suffered from a significant reduction of the remanent polarization (P-r) after a certain number of read/write cycles (electrical fatigue). We now report the development of fatigue-free lanthanum-modified PZT capacitors using common Pt electrodes. The capacitors fabricated at 580 degreesC by applying a PZT seed layer exhibited fatigue-free behavior up to 6.5x10(10) switching cycles, a quite stable charge retention profile with time, and comparatively high P-r values, all of which assure their suitability for practical FRAM applications. (C) 2001 American Institute of Physics.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleFatigue-free lead zirconate titanate-based capacitors for nonvolatile memories-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.1392970-
dc.author.googleShannigrahi, SRen_US
dc.author.googleJang, HMen_US
dc.relation.volume79en_US
dc.relation.issue7en_US
dc.relation.startpage1051en_US
dc.relation.lastpage1053en_US
dc.contributor.id10084272en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.79, no.7, pp.1051 - 1053-
dc.identifier.wosid000170277500053-
dc.date.tcdate2019-01-01-
dc.citation.endPage1053-
dc.citation.number7-
dc.citation.startPage1051-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume79-
dc.contributor.affiliatedAuthorJang, HM-
dc.identifier.scopusid2-s2.0-0035855054-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc78-
dc.type.docTypeArticle-
dc.subject.keywordPlusFERROELECTRIC THIN-FILMS-
dc.subject.keywordPlusELECTRICAL-PROPERTIES-
dc.subject.keywordPlusHETEROSTRUCTURES-
dc.subject.keywordPlusTECHNOLOGY-
dc.subject.keywordPlusRETENTION-
dc.subject.keywordPlusPHYSICS-
dc.subject.keywordPlusIMPRINT-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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장현명JANG, HYUN MYUNG
Div of Advanced Materials Science
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