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Cited 29 time in webofscience Cited 33 time in scopus
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dc.contributor.authorRyu, S-
dc.contributor.authorSon, JY-
dc.contributor.authorShin, YH-
dc.contributor.authorJang, HM-
dc.contributor.authorScott, JF-
dc.date.accessioned2015-06-25T01:23:03Z-
dc.date.available2015-06-25T01:23:03Z-
dc.date.created2010-09-15-
dc.date.issued2009-12-14-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000020041en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9663-
dc.description.abstractAn [001]-oriented BiFeO3 (BFO) thin film having a pseudotetragonal symmetry was epitaxially grown on a Pt/MgO (001) substrate. The Pt-buffered MgO substrate enabled us to fabricate an epitaxial heterostructure at a temperature as low as 500 degrees C. We examined three major criteria for high-density ferroelectric memories using this BFO/Pt film capacitor. The polarization switching experiment has demonstrated that the film is electrically fatigue-free and possesses stable charge-retention characteristics with a reasonably large sensing margin of 22 mu C/cm(2). These suggest potential applicability of the present BFO/Pt heteroepitaxial film capacitor to nonvolatile memories.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titlePolarization switching characteristics of BiFeO3 thin films epitaxially grown on Pt/MgO at a low temperature-
dc.typeArticle-
dc.contributor.college첨단재료과학부en_US
dc.identifier.doi10.1063/1.3275012-
dc.author.googleRyu, Sen_US
dc.author.googleSon, JYen_US
dc.author.googleScott, JFen_US
dc.author.googleJang, HMen_US
dc.author.googleShin, YHen_US
dc.relation.volume95en_US
dc.relation.issue24en_US
dc.relation.startpage242902-1en_US
dc.relation.lastpage242902-3en_US
dc.contributor.id10084272en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.95, no.24, pp.242902-1 - 242902-3-
dc.identifier.wosid000272954900043-
dc.date.tcdate2019-01-01-
dc.citation.endPage242902-3-
dc.citation.number24-
dc.citation.startPage242902-1-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume95-
dc.contributor.affiliatedAuthorSon, JY-
dc.contributor.affiliatedAuthorShin, YH-
dc.contributor.affiliatedAuthorJang, HM-
dc.identifier.scopusid2-s2.0-77955828283-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc26-
dc.description.scptc29*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusFERROELECTRIC MEMORIES-
dc.subject.keywordPlusHETEROSTRUCTURES-
dc.subject.keywordPlusNANOSCALE-
dc.subject.keywordPlusPHYSICS-
dc.subject.keywordAuthorbismuth compounds-
dc.subject.keywordAuthordielectric polarisation-
dc.subject.keywordAuthorepitaxial growth-
dc.subject.keywordAuthorepitaxial layers-
dc.subject.keywordAuthorferroelectric capacitors-
dc.subject.keywordAuthorferroelectric storage-
dc.subject.keywordAuthorferroelectric switching-
dc.subject.keywordAuthorferroelectric thin films-
dc.subject.keywordAuthorsputter deposition-
dc.subject.keywordAuthorthin film capacitors-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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장현명JANG, HYUN MYUNG
Div of Advanced Materials Science
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