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Cited 114 time in webofscience Cited 113 time in scopus
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dc.contributor.authorBong, H-
dc.contributor.authorLee, WH-
dc.contributor.authorLee, DY-
dc.contributor.authorKim, BJ-
dc.contributor.authorCho, JH-
dc.contributor.authorCho, K-
dc.date.accessioned2015-06-25T01:25:48Z-
dc.date.available2015-06-25T01:25:48Z-
dc.date.created2012-03-29-
dc.date.issued2010-05-10-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000021378en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9708-
dc.description.abstractLow voltage high mobility n-type thin film transistors (TFTs) based on sol-gel processed zinc oxide (ZnO) were fabricated using a high capacitance ion gel gate dielectric. The ion gel gated solution-processed ZnO TFTs were found to exhibit excellent electrical properties. TFT carrier mobilities were 13 cm(2)/V s, ON/OFF current ratios were 10(5), regardless of the sintering temperature used for the preparation of the ZnO thin films. Ion gel gated ZnO TFTs are successfully demonstrated on plastic substrates for the large area flexible electronics. (C) 2010 American Institute of Physics. [doi:10.1063/1.3428357]-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleHigh-mobility low-temperature ZnO transistors with low-voltage operation-
dc.typeArticle-
dc.contributor.college화학공학과en_US
dc.identifier.doi10.1063/1.3428357-
dc.author.googleBong, Hen_US
dc.author.googleLee, WHen_US
dc.author.googleCho, Ken_US
dc.author.googleCho, JHen_US
dc.author.googleKim, BJen_US
dc.author.googleLee, DYen_US
dc.relation.volume96en_US
dc.relation.issue19en_US
dc.contributor.id10077904en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.96, no.19-
dc.identifier.wosid000277756400039-
dc.date.tcdate2019-01-01-
dc.citation.number19-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume96-
dc.contributor.affiliatedAuthorCho, K-
dc.identifier.scopusid2-s2.0-77952997651-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc88-
dc.description.scptc92*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusTHIN-FILM TRANSISTORS-
dc.subject.keywordPlusGATE DIELECTRICS-
dc.subject.keywordPlusPOLYMER-
dc.subject.keywordPlusCIRCUITS-
dc.subject.keywordAuthorcarrier mobility-
dc.subject.keywordAuthordielectric materials-
dc.subject.keywordAuthorflexible electronics-
dc.subject.keywordAuthorgels-
dc.subject.keywordAuthorII-VI semiconductors-
dc.subject.keywordAuthorsemiconductor thin films-
dc.subject.keywordAuthorsintering-
dc.subject.keywordAuthorsol-gel processing-
dc.subject.keywordAuthorthin film transistors-
dc.subject.keywordAuthorzinc compounds-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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조길원CHO, KIL WON
Dept. of Chemical Enginrg
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