DC Field | Value | Language |
---|---|---|
dc.contributor.author | PARK, HYUNG GYU | - |
dc.contributor.author | Ruiz-Vargas, Carlos | - |
dc.contributor.author | Reissner, Patrick | - |
dc.contributor.author | Wagner, Tino | - |
dc.contributor.author | Wyss, Roman | - |
dc.contributor.author | Stemmer, Andreas | - |
dc.date.accessioned | 2019-05-07T07:30:59Z | - |
dc.date.available | 2019-05-07T07:30:59Z | - |
dc.date.created | 2019-05-06 | - |
dc.date.issued | 2015-09-11 | - |
dc.identifier.issn | 0957-4484 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/98773 | - |
dc.description.abstract | Nanoparticle network devices find growing application in sensing and electronics. One recurring challenge in the design and fabrication of this class of devices is ensuring a stable interface via robust yet unobstructive electrodes. A figure of merit which dictates the minimum electrode overlap required for optimal charge injection into the network is the contact transfer length. However, we find that traditional contact characterization using the transmission line model, an indirect method which requires extrapolation, is insufficient for network devices. Instead, we apply Kelvin probe force microscopy to characterize the contact resistance by imaging the surface potential with nanometer resolution. We then use scanning probe lithography to directly investigate the contact transfer length. We have determined the transfer length in graphene contacted devices to be 200-400 nm, thus apt for further device reduction which is often necessary for on-site sensing applications. Simulations from a two-dimensional resistor model support our observations and are expected to be an important tool for further optimizing the design of nanoparticle-based devices. | - |
dc.language | English | - |
dc.publisher | Institute of Physics Publishing | - |
dc.relation.isPartOf | Nanotechnology | - |
dc.title | Contact Transfer Length Investigation of a 2D Nanoparticle Network by Scanning Probe Microscopy | - |
dc.type | Article | - |
dc.identifier.doi | 10.1088/0957-4484/26/36/365701 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | Nanotechnology, v.26, no.36, pp.365702 | - |
dc.identifier.wosid | 000360973400012 | - |
dc.citation.number | 36 | - |
dc.citation.startPage | 365702 | - |
dc.citation.title | Nanotechnology | - |
dc.citation.volume | 26 | - |
dc.contributor.affiliatedAuthor | PARK, HYUNG GYU | - |
dc.identifier.scopusid | 2-s2.0-84940056753 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | nanoparticles | - |
dc.subject.keywordAuthor | Kelvin probe force microscopy | - |
dc.subject.keywordAuthor | scanning probe lithography | - |
dc.subject.keywordAuthor | CVD graphene | - |
dc.subject.keywordAuthor | self-assembly | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
library@postech.ac.kr Tel: 054-279-2548
Copyrights © by 2017 Pohang University of Science ad Technology All right reserved.