An Inorganic-Organic Diblock Copolymer Photoresist for Direct Mesoporous SiCN Ceramic Patterns via Photolithography
SCIE
SCOPUS
- Title
- An Inorganic-Organic Diblock Copolymer Photoresist for Direct Mesoporous SiCN Ceramic Patterns via Photolithography
- Authors
- Chi, TN; Phan, HH; Perumal, J; Kim, DP
- Date Issued
- 2011-03
- Publisher
- ROYAL SOC CHEMISTRY
- Abstract
- A high resolution negative-tone-type of inorganic-organic diblock copolymer photoresist was synthesized as a novel precursor for simple and direct fabrication of SiCN ceramic mesoporous patterns with ordered nanoscale pores by using a "top-down" photolithographic technique and the subsequent sacrificial processes of a "bottom-up" self-assembled nanostructure.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/9983
- DOI
- 10.1039/C0CC05836J
- ISSN
- 1359-7345
- Article Type
- Article
- Citation
- CHEMICAL COMMUNICATIONS, vol. 47, no. 12, page. 3484 - 3486, 2011-03
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