DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, JH | - |
dc.contributor.author | Kim, JY | - |
dc.contributor.author | Rhee, SW | - |
dc.contributor.author | Rhee, W | - |
dc.date.accessioned | 2015-06-25T01:49:33Z | - |
dc.date.available | 2015-06-25T01:49:33Z | - |
dc.date.created | 2009-03-16 | - |
dc.date.issued | 1999-12 | - |
dc.identifier.issn | 1099-0062 | - |
dc.identifier.other | 2015-OAK-0000010187 | en_US |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/10094 | - |
dc.description.abstract | The chemical and deposition properties of RuO2 thin films with the liquid precursor Ru(OD)(3) (OD = 2,4-octanedionate) have been investigated. By thermal analysis, Ru(OD)(3) was thermally stable in Ar atmosphere and rapidly reacted with oxygen at about 270 degrees C. The RuO2 thin films deposited at 250-550 degrees C had a dense and octahedral-like morphology and the minimum resistivity was 48 mu Omega cm at a deposition temperature of 350 degrees C. (C) 1999 The Electrochemical Society. S1099-0062(99)06-130-1. All rights reserved. | - |
dc.description.statementofresponsibility | open | en_US |
dc.language | English | - |
dc.publisher | ELECTROCHEMICAL SOC INC | - |
dc.relation.isPartOf | ELECTROCHEMICAL AND SOLID STATE LETTERS | - |
dc.rights | BY_NC_ND | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
dc.title | Chemical vapor deposition of RuO2 thin films using the liquid precursor Ru(OD)(3) | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | en_US |
dc.identifier.doi | 10.1149/1.1390927 | - |
dc.author.google | Lee, JH | en_US |
dc.author.google | Kim, JY | en_US |
dc.author.google | Rhee, W | en_US |
dc.author.google | Rhee, SW | en_US |
dc.relation.volume | 2 | en_US |
dc.relation.issue | 12 | en_US |
dc.relation.startpage | 622 | en_US |
dc.relation.lastpage | 623 | en_US |
dc.contributor.id | 10052631 | en_US |
dc.relation.journal | ELECTROCHEMICAL AND SOLID STATE LETTERS | en_US |
dc.relation.index | SCI급, SCOPUS 등재논문 | en_US |
dc.relation.sci | SCI | en_US |
dc.collections.name | Journal Papers | en_US |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | ELECTROCHEMICAL AND SOLID STATE LETTERS, v.2, no.12, pp.622 - 623 | - |
dc.identifier.wosid | 000083343900006 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 623 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 622 | - |
dc.citation.title | ELECTROCHEMICAL AND SOLID STATE LETTERS | - |
dc.citation.volume | 2 | - |
dc.contributor.affiliatedAuthor | Rhee, SW | - |
dc.identifier.scopusid | 2-s2.0-0033284426 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 17 | - |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Electrochemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
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