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Interface trap curing effects on high-k gate stack (Al/Al2O3/Si-sub) by rapid thermal anneal (RTA)
- Title
- Interface trap curing effects on high-k gate stack (Al/Al2O3/Si-sub) by rapid thermal anneal (RTA)
- Date Issued
- 2020-07-01
- Publisher
- NANO KOREA
- Article Type
- Conference
- Citation
- The 18th International Nanotech Symposium & Exhibition, 2020-07-01
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Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg