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Cited 10 time in webofscience Cited 15 time in scopus
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High power 0.25 mu m gate GaNHEMTs on sapphire with power density 4.2 W/mm at 10 GHz SCIE SCOPUS

Title
High power 0.25 mu m gate GaNHEMTs on sapphire with power density 4.2 W/mm at 10 GHz
Authors
Youn, RHKumar, VLee, JHSchwindt, RChang, WJHong, JYJeon, CMBae, SBPark, MRLee, KSLee, JLLee, JHAdesida, I
Date Issued
2003-03-20
Publisher
IEE-INST ELEC ENG
Abstract
Metal organic chemical vapour deposition-grown AlGaN/GaN high electron mobility transistors (HEMTs) with power density up to 4.2 W/mm, one of the highest values ever reported for 0.25 mum gate-length AlGaN/GaN HEMTs, were fabricated on sapphire 2 substrates. The devices exhibited maximum drain current density as high as 1370 mA/mm high transconductance up to 223 mS/mm. short-circuit current gain cutoff frequency of (f(T)) 67 GHz, and maximum frequency of oscillation (f(max)) of 102 GHz.
Keywords
ALGAN/GAN HEMTS; MICROWAVE; PERFORMANCE; GAN
URI
https://oasis.postech.ac.kr/handle/2014.oak/18601
DOI
10.1049/EL:20030339
ISSN
0013-5194
Article Type
Article
Citation
ELECTRONICS LETTERS, vol. 39, no. 6, page. 566 - 567, 2003-03-20
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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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