DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, DH | - |
dc.contributor.author | Park, BJ | - |
dc.contributor.author | Yeom, GY | - |
dc.contributor.author | Kim, SJ | - |
dc.contributor.author | Lee, JK | - |
dc.contributor.author | Baek, KH | - |
dc.contributor.author | Kang, CJ | - |
dc.date.accessioned | 2016-04-01T02:12:05Z | - |
dc.date.available | 2016-04-01T02:12:05Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2005-04 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.other | 2005-OAK-0000005045 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/24643 | - |
dc.description.abstract | In this study, the effect of using a neutral beam formed by low-angle forward reflection of a reactive ion beam on aspect-ratio-dependent etching (ABDE) has been investigated. When a SF6 inductively coupled plasma and SF6 ion beam etching are used to etch poly-Si, ARDE is observed, and the etching of poly-Si on SiO2 shows a higher ABDE effect than the etching of poly-Si on Si. However, by using neutral beam etching with neutral beam directionality higher than 70 %, ARDE during poly-Si etching by SF6 can be effectively removed, regardless of the sample conditions. The mechanism for the removal of ARDE via a directional neutral beam has been demonstrated through a computer simulation of different nanoscale features by using the two-dimensional XOOPIC code and the TRIM code. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.relation.isPartOf | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.subject | neutral beam etching | - |
dc.subject | RIE-lag | - |
dc.subject | low-angle surface reflection | - |
dc.subject | DAMAGE | - |
dc.subject | SIO2 | - |
dc.subject | PLASMAS | - |
dc.title | Removal of aspect-ratio-dependent etching by low-angle forward reflected neutral-beam etching | - |
dc.type | Article | - |
dc.contributor.college | 전자전기공학과 | - |
dc.author.google | Lee, DH | - |
dc.author.google | Park, BJ | - |
dc.author.google | Yeom, GY | - |
dc.author.google | Kim, SJ | - |
dc.author.google | Lee, JK | - |
dc.author.google | Baek, KH | - |
dc.author.google | Kang, CJ | - |
dc.relation.volume | 46 | - |
dc.relation.issue | 4 | - |
dc.relation.startpage | 867 | - |
dc.relation.lastpage | 871 | - |
dc.contributor.id | 10158178 | - |
dc.relation.journal | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.46, no.4, pp.867 - 871 | - |
dc.identifier.wosid | 000228458900021 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 871 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | 867 | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 46 | - |
dc.contributor.affiliatedAuthor | Lee, JK | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 9 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | DAMAGE | - |
dc.subject.keywordPlus | SIO2 | - |
dc.subject.keywordPlus | PLASMAS | - |
dc.subject.keywordAuthor | neutral beam etching | - |
dc.subject.keywordAuthor | RIE-lag | - |
dc.subject.keywordAuthor | low-angle surface reflection | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Physics | - |
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