DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jang, K | - |
dc.contributor.author | Park, H | - |
dc.contributor.author | Jung, S | - |
dc.contributor.author | Van Duy, N | - |
dc.contributor.author | Kim, Y | - |
dc.contributor.author | Cho, J | - |
dc.contributor.author | Choi, H | - |
dc.contributor.author | Kwon, T | - |
dc.contributor.author | Lee, W | - |
dc.contributor.author | Gong, D | - |
dc.contributor.author | Park, S | - |
dc.contributor.author | Yi, J | - |
dc.contributor.author | Kim, D | - |
dc.contributor.author | Kim, H | - |
dc.date.accessioned | 2016-04-01T03:08:42Z | - |
dc.date.available | 2016-04-01T03:08:42Z | - |
dc.date.created | 2010-04-23 | - |
dc.date.issued | 2010-03-01 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.other | 2010-OAK-0000020645 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/26310 | - |
dc.description.abstract | Al-doped ZnO (AZO) thin films have been prepared on the c-Si oriented direction of (100) and glass substrates, by radio frequency magnetron sputtering from ZnO-2 wt.% Al2O3 ceramic targets. The effects of the working pressure on the optical and electrical properties of the films have been studied. The optical properties, measured by the ultraviolet-visible system, show that the transmittance and optical bandgap energy are influenced by the working pressure. The Hall resistivity, mobility, and carrier concentration were obtained by a Hall measurement system and these parameters were also influenced by the working pressure. The AZO thin-film transistors (TFTs) were fabricated on highly doped c-Si substrates. The TFT structures were made up AZO as the active layer and SiOxNy/SiNx/SiOx as the gate layer with 20 nm and 35 nm thickness, respectively. The ultra-thin TFTs had an on/off current ratio of 10(4) and a field-effect mobility of 0.17 cm(2)/V.s. These results show that it is possible to fabricate an AZO TFT that can be operated with an ultra-thin gate dielectric. (C) 2009 Elsevier B.V. All rights reserved. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.relation.isPartOf | THIN SOLID FILMS | - |
dc.subject | Al-doped zinc oxide | - |
dc.subject | Radio-frequency magnetron sputtering | - |
dc.subject | Hall effect measurements | - |
dc.subject | UV/VIS spectroscopy | - |
dc.subject | Thin film transistors | - |
dc.subject | ZINC-OXIDE | - |
dc.subject | ROOM-TEMPERATURE | - |
dc.subject | SUBSTRATE-TEMPERATURE | - |
dc.subject | DEPOSITION | - |
dc.subject | PRESSURE | - |
dc.subject | LAYER | - |
dc.subject | TFTS | - |
dc.title | Optical and electrical properties of 2 wt.% Al2O3-doped ZnO films and characteristics of Al-doped ZnO thin-film transistors with ultra-thin gate insulators | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1016/J.TSF.2009.08.036 | - |
dc.author.google | Jang, Kyungsoo | - |
dc.author.google | Park, Hyeongsik | - |
dc.author.google | Jung, Sungwook | - |
dc.author.google | Van Duy, Nguyen | - |
dc.author.google | Kim, Youngkuk | - |
dc.author.google | Cho, Jaehyun | - |
dc.author.google | Choi, Hyungwook | - |
dc.author.google | Kwon, Taeyoung | - |
dc.author.google | Lee, Wonbaek | - |
dc.author.google | Gong, Daeyeong | - |
dc.author.google | Park, Seungman | - |
dc.author.google | Yi, Junsin | - |
dc.author.google | Kim, Doyoung | - |
dc.author.google | Kim, Hyungjun | - |
dc.relation.volume | 518 | - |
dc.relation.issue | 10 | - |
dc.relation.startpage | 2808 | - |
dc.relation.lastpage | 2811 | - |
dc.relation.journal | THIN SOLID FILMS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.518, no.10, pp.2808 - 2811 | - |
dc.identifier.wosid | 000275920000039 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 2811 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 2808 | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 518 | - |
dc.contributor.affiliatedAuthor | Kim, H | - |
dc.identifier.scopusid | 2-s2.0-76049113550 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 29 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | ZINC-OXIDE | - |
dc.subject.keywordPlus | SUBSTRATE-TEMPERATURE | - |
dc.subject.keywordPlus | PRESSURE | - |
dc.subject.keywordPlus | LAYER | - |
dc.subject.keywordPlus | TFTS | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordAuthor | Al-doped zinc oxide | - |
dc.subject.keywordAuthor | Radio-frequency magnetron sputtering | - |
dc.subject.keywordAuthor | Hall effect measurements | - |
dc.subject.keywordAuthor | UV/VIS spectroscopy | - |
dc.subject.keywordAuthor | Thin film transistors | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
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