PATTERN-TRANSFER FIDELITY IN SOFT LITHOGRAPHY: THE ROLE OF PATTERN DENSITY AND ASPECT RATIO
SCIE
SCOPUS
- Title
- PATTERN-TRANSFER FIDELITY IN SOFT LITHOGRAPHY: THE ROLE OF PATTERN DENSITY AND ASPECT RATIO
- Authors
- Lee, TW; Mitrofanov, O; Hsu, JWR
- Date Issued
- 2005-10
- Publisher
- WILEY-V C H VERLAG GMBH
- Abstract
- Using high-aspect-ratio nanostructures fabricated via two-photon laser-scanning lithography, we examine the deformation of elastomeric stamps used in soft nanolithography and the fidelity of patterns and replicas made using these stamps. Two-photon laser-scanning lithography enables us to systematically regulate the aspect ratio and pattern density of the nanostructures by varying laser-scanning parameters such as the intensity of the laser beam, the scanning speed, the focal depth inside the resist, and the scanning-line spacing. Two commercially available stamp/mold materials with different moduli have been investigated. We find that the pattern-transfer fidelity is strongly affected by the pattern density. In addition, we demonstrate that true three-dimensional structures can be successfully replicated because of the flexible nature of elastomeric poly(dimethylsiloxane).
- Keywords
- 2-PHOTON LITHOGRAPHY; SURFACE-TENSION; HIGH-RESOLUTION; PHOTOPOLYMERIZATION; MICROFABRICATION; DEFORMATION; PHOTORESIST; FEATURES; COLLAPSE; STAMP
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/28869
- DOI
- 10.1002/ADFM.2004002
- ISSN
- 1616-301X
- Article Type
- Article
- Citation
- ADVANCED FUNCTIONAL MATERIALS, vol. 15, no. 10, page. 1683 - 1688, 2005-10
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