Carbon nanotube-induced chemical etching of SiO2 layer for sub-10 nm lithography and its mechanism study
- Title
- Carbon nanotube-induced chemical etching of SiO2 layer for sub-10 nm lithography and its mechanism study
- Authors
- 최희철; 변혜령
- Date Issued
- 2007-11-27
- Publisher
- Material research societ
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/47044
- Article Type
- Conference
- Citation
- 2007 MRS Fall Meeting, 2007-11-27
- Files in This Item:
- There are no files associated with this item.
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