DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, SY | - |
dc.contributor.author | Lee, JL | - |
dc.date.accessioned | 2015-06-25T01:11:44Z | - |
dc.date.available | 2015-06-25T01:11:44Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2005-12-05 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.other | 2015-OAK-0000005555 | en_US |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/9489 | - |
dc.description.abstract | The 4,4'-bis[N-(1-naphtyl)-N-phenyl-amino]biphenyl was in situ deposited on both iridium-oxide-coated indium-tin-oxide (IrOx-ITO) and O-2-plasma-treated ITO (O-2-ITO), and their interface dipole energies were quantitatively determined using synchrotron radiation photoemission spectroscopy. The dipole energies of both O-2-ITO and IrOx-ITO were same with each other, -0.3 eV, meaning the formation of same amount of interface dipole. The secondary electron emission spectra revealed that the work function of IrOx-ITO is higher by 0.5 eV than that of O-2-ITO, resulting in the decrease of the turn-on voltage via reduction of hole injection barrier. (c) 2005 Americian Institute of Physics. | - |
dc.description.statementofresponsibility | open | en_US |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.rights | BY_NC_ND | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
dc.title | Effect of thin iridium oxide on the formation of interface dipole in organic light-emitting diodes | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | en_US |
dc.identifier.doi | 10.1063/1.2135874 | - |
dc.author.google | Kim, SY | en_US |
dc.author.google | Lee, JL | en_US |
dc.relation.volume | 87 | en_US |
dc.relation.issue | 23 | en_US |
dc.contributor.id | 10105416 | en_US |
dc.relation.journal | APPLIED PHYSICS LETTERS | en_US |
dc.relation.index | SCI급, SCOPUS 등재논문 | en_US |
dc.relation.sci | SCI | en_US |
dc.collections.name | Journal Papers | en_US |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.87, no.23 | - |
dc.identifier.wosid | 000233723200043 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.number | 23 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 87 | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.identifier.scopusid | 2-s2.0-28444449428 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 31 | - |
dc.description.scptc | 23 | * |
dc.date.scptcdate | 2018-10-274 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | ENERGY-LEVEL ALIGNMENT | - |
dc.subject.keywordPlus | DEVICES | - |
dc.subject.keywordPlus | METAL | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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