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Cited 10 time in webofscience Cited 13 time in scopus
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dc.contributor.authorKwak, CH-
dc.contributor.authorKim, BH-
dc.contributor.authorPark, CI-
dc.contributor.authorSeo, SY-
dc.contributor.authorKim, SH-
dc.contributor.authorHan, SW-
dc.date.accessioned2015-06-25T01:25:52Z-
dc.date.available2015-06-25T01:25:52Z-
dc.date.created2010-05-11-
dc.date.issued2010-02-01-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000021230en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9709-
dc.description.abstractVertically-well-aligned ZnO nanorods were synthesized on Ti buffer layers by a metal-organic chemical-vapor deposition process. Structural analyses demonstrated that the ZnO nanorods were well-aligned in the c-axis and ab-plane. Transmission electron microscopy (TEM) showed that the Ti buffer layer was amorphous and interdiffused into the ZnO nanorods. Energy-dispersive spectroscopy (EDS) analysis revealed the Ti buffer layers to be slightly oxide. Extended x-ray absorption fine structure confirmed the TEM and EDS results. The I-V characteristic measurements showed a 20-fold increase in current density with the Ti buffer layer, suggesting excellent electrical contact between the Ti buffer layer and ZnO nanorods.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMERICAN INSTITUTE OF PYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleStructural and Electrical Properties of ZnO Nanorods and Ti Buffer Layers-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.3308498-
dc.author.googleKwak, CHen_US
dc.author.googleKim, BHen_US
dc.author.googleHan, SWen_US
dc.author.googleKim, SHen_US
dc.author.googleSeo, SYen_US
dc.author.googlePark, CIen_US
dc.relation.volume96en_US
dc.relation.issue51908en_US
dc.contributor.id10077433en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.96, no.51908-
dc.identifier.wosid000274319500036-
dc.date.tcdate2019-01-01-
dc.citation.number51908-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume96-
dc.contributor.affiliatedAuthorKim, SH-
dc.identifier.scopusid2-s2.0-76449092779-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc5-
dc.type.docTypeArticle-
dc.subject.keywordAuthorbuffer layers-
dc.subject.keywordAuthorcurrent density-
dc.subject.keywordAuthorelectrical contacts-
dc.subject.keywordAuthorEXAFS-
dc.subject.keywordAuthorII-VI semiconductors-
dc.subject.keywordAuthorMOCVD-
dc.subject.keywordAuthortitanium-
dc.subject.keywordAuthortransmission electron microscopy-
dc.subject.keywordAuthorX-ray chemical analysis-
dc.subject.keywordAuthorzinc compounds-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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김선효KIM, SEON HYO
Ferrous & Energy Materials Technology
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